FISCHERSCOPE® X-RAY XDV-µ® WAFER
precision even with short measuring times
with smallest spot size 10 µm (FWHM)
for reliable measuring of small structures
¹ Up to 50 % increased performance: Significantly improved standard deviation and thus gauge capability or significantly reduced measurement time compared DPP to DPP+.
² High-end capillary optics made by Fischer – the world's only manufacturer of X-ray fluorescence measuring instruments with its own polycapillary production. Three different high-end polycapillaries available – the right solution for each of your applications: 10 µm halo-free, 20 µm halo-free or 20 µm halo.
Meets all requirements for accurate wafer control.
Due to the programmable measuring table with vacuum wafer chuck and microfocus tube Ultra, the FISCHERSCOPE® X-RAY XDV®-µ WAFER is optimally tailored to the needs of the semiconductor industry. Polycapillary optics built into the XRF device concentrate the X-ray radiation on smallest measuring spots of 10 or 20 µm for short measuring times at high intensity. This allows you to analyze individual microstructures much more precisely than with conventional devices - and completely automated.
Fully integrated solution.
XDV®-μ SEMI combined with wafer handler of your choice
Accurate and precise.
Positioning of the measuring point on small structures thanks to automatic image recognition
Meeting all challenges.
Reliable and fast results for ambitious measuring tasks
Fully automatable.
Let your instrument work for you with just one click
Most advanced polycapillary optics on the market.
Our in-house manufactured polycapillary optics deliver outstanding measurement results at short measuring times
DPP+ digital pulse processor.
Shorter measuring times or improvement of standard deviation*
*compared to the DPP
Features
Microfocus tube Ultra with tungsten anode for even higher performance on smallest spots with µ-XRF; Molybdenum anode optional
DPP+ for highest precision even with short measuring times
4-fold changeable filter
In-house manufactured polycapillary optics allow especially small measuring spots with high intensity
Measuring spot approx.: Ø 10 or 20 µm (FWHM)
Up to 5 mm possible height of samples
Silicon drift detector with 20 or 50 mm² for highest precision on thin layers
Vacuum table with holders for all standard wafer formats from 150 - 300 mm
Extensive options for automation with WinFTM®
Application examples
- Measuring of smallest structures on wafers up to 12 inch diameter
- Analysis of very thin coatings, such as gold/palladium layers down to < 10 nm
- Automated measuring such as in quality control
- Determination of complex multilayer systems
Do you have further applications? Then contact us!